Acne safe
HAUS LABS BY LADY GAGA | Sepho
Triclone Skin Tech Medium Coverage Foundation with Fermented Arnica
Acne Safety Check
No flagged pore-clogging ingredients were found in the available ingredient list.
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Full Ingredients
Aqua (Water, Eau), Diphenylsiloxy Phenyl Trimethicone, Phenyl Trimethicone, Caprylyl Methicone, Trimethylsiloxysilicate, Propylene Glycol Dibenzoate, Isododecane, Glycerin, Butylene Glycol, Methyl Trimethicone, Lauryl Polyglyceryl-3 Polydimethylsiloxyethyl Dimethicone, C13-15 Alkane, Polyglyceryl-3 Polydimethylsiloxyethyl Dimethicone, Alcohol Denat, Acrylates/Polytrimethylsiloxymethacrylate Copolymer, Polymethylsilsesquioxane, Sorbitan Sesquioleate, Disteardimonium Hectorite, 1, 2-Hexanediol, Palmitoyl Tetrapeptide-10, Arnica Montana Flower Extract**, Hydrolyzed Hyaluronic Acid, Squalane, Pseudozyma Epicola/Camellia Sinensis Seed Oil Ferment Extract Filtrate, Solanum Lycopersicum (Tomato) Fruit Extract, Dunaliella Salina Extract, Hedychium Coronarium Root Extract, Tocopherol, Althaea Rosea Flower Extract, Taraxacum Officinale (Dandelion) Extract, Perilla Ocymoides Leaf Extract, Panax Notoginseng Extract, Glycyrrhiza Glabra (Licorice) Root Extract, Chamomilla Recutita (Matricaria) Extract, Centella Asiatica Extract, Pseudozyma Epicola/Sunflower Seed Oil Ferment Extract Filtrate, Caprylyl Glycol, Ethylhexylglycerin, Magnesium Sulfate, Polypropylsilsesquioxane, Acrylates/Dimethicone Copolymer, Triethoxycaprylylsilane, Dimethicone/Vinyl Dimethicone Crosspolymer, Aluminum Hydroxide, CI 77891 (Titanium Dioxide), CI 77491/77492/77499 (Iron Oxides). **Fermented