Acne safe
HAUS LABS BY LADY GAGA |
Triclone Skin Tech Hydrating + De-puffing Concealer with Fermented Arnica
Acne Safety Check
No flagged pore-clogging ingredients were found in the available ingredient list.
Matched Ingredients
No ingredient matches were listed for this product.
Full Ingredients
Aqua (Water, Eau), Glycerin, Diphenylsiloxy Phenyl Trimethicone, Trimethylsiloxysilicate, Polymethylsilsesquioxane, Caprylyl Methicone, Lauryl Polyglyceryl-3 Polydimethylsiloxyethyl Dimethicone, C13-15 Alkane, Isododecane, Dimethicone, Methyl Trimethicone, Polypropylsilsesquioxane, Phenyl Trimethicone, Disteardimonium Hectorite, Magnesium Sulfate, Acrylates/Dimethicone Copolymer, Arnica Montana Flower Extract**, Niacinamide, Squalane, Hydrolyzed Hyaluronic Acid, Coleus Forskohlii Root Extract, Sodium Hyaluronate, Hyaluronic Acid, Pseudozyma Epicola/Camellia Sinensis Seed Oil Ferment Extract Filtrate, Solanum Lycopersicum (Tomato) Fruit Extract, Dunaliella Salina Extract, Sodium Acetylated Hyaluronate, Sodium Hyaluronate Crosspolymer, Pseudanabaena Galeata Extract, Hydrolyzed Sodium Hyaluronate, Tocopherol, Potassium Hyaluronate, Pseudozyma Epicola/Sunflower Seed Oil Ferment Extract Filtrate, Betaine, Hydroxypropyltrimonium Hyaluronate, Caprylyl Glycol, Aloe Barbadensis Leaf Extract, Sorbitan Sesquioleate, Polyglyceryl-3 Polydimethylsiloxyethyl Dimethicone, Acrylates/Polytrimethylsiloxymethacrylate Copolymer, 1, 2-Hexanediol, Ethylhexylglycerin, Dimethicone/Vinyl Dimethicone Crosspolymer, Cetearyl Dimethicone/Vinyl Dimethicone Crosspolymer, Triethoxycaprylylsilane, Xanthan Gum, Silica Silylate, Aluminum Hydroxide, Boron Nitride, CI 77491/77492/77499 (Iron Oxides), CI 77891 (Titanium Dioxide). **Fermented